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HomeMIT 6.774 Physics of Microfabrication: Front End Processing, Fall 20045. Wafer Cleaning and Gettering - Contamination Measurement Techniques

MIT 6.774 Physics of Microfabrication: Front End Processing, Fall 2004

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5. Wafer Cleaning and Gettering - Contamination Measurement Techniques

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6. Oxidation and the Si/SiO2 Interface. Deal/Grove Model, Thin Oxide Models

5. Wafer Cleaning and Gettering - Contamination Measurement Techniques. Duration: 1:16:00.